Picosun Group launched Sprinter, a new fast batch ALD tool for 300 mm wafers, earlier this year at the SEMI Technology Unites Global Summit digital event, held on 15 – 19 February 2021. In that event we presented basic process results of Al2O3 films deposited in the Sprinter ALD tool. In this presentation, we will report additional results obtained with the PICOSUN® Sprinter tool: Optimized 90 °C low temperature Al2O3 ALD process aimed for barrier applications, and BEOL compatible thermal SiO2 ALD process at 300 °C.
Dr. Tom Blomberg works as the R&D team leader in Picosun Oy and is responsible for new reactor technology development and research. He has more than 20 years of experience in developing ALD technology for the semiconductor manufacturing market. He has authored or co-authored around 30 publications on thin film deposition and energy related matters and holds more than 30 US or international patents on different subjects in the ALD and related technologies.