PIC fabrication tolerances are inevitable and strongly degrade device yield, unless their impact on overall performance characteristics is considered during the design process. We present a general-purpose schematic-driven design framework that provides easy access to statistical performance techniques. By introducing a novel method that allows for the identification of critical light paths and applying automated phase compensation inside the models, the analysis of fabrication tolerances on-wafer and between wafers is significantly simplified. We demonstrate its application in several PIC designs including complex photonics-based neural networks.
Dr. André Richter is an expert in optical communications and photonics including related modeling and design aspects. He holds a M.Sc. degree from Georgia Tech and a Ph.D. from TU Berlin. Since joining the VPIphotonics team, André contributed numerous fundamental technical advances and product innovations in various fields of applications. For many years he led international teams in product management, technical services and R&D activities, and since 2013 serves as General Manager of VPIphotonics.